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Greg Taylor's avatar

The approximately equal strength of PMOS and NMOS devices seen on newer processes is a result of strained silicon, which was introduced on planar processes. The amount of strain in the first generation of strained silicon wasn't sufficient to achieve equal mobility but it did reduce the mobility gap between PMOS and NMOS devices. With increasing strain in newer process iterations, after 3 or 4 generations PMOS mobility exceeded NMOS, delivering the results that you noted. This aligned in time with the FINFET transition. This differential impact occurs because it is easier to deliver large amounts of compression (benefiting hole mobility) to PMOS devices than to deliver similar amounts of tension (benefiting electron mobility) to NMOS devices.

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Shambukari Jayanth's avatar

Hello, what application did you use to generate those layouts and view them in 3d?

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